OH2 is a dedicated focussing station for EH3. The optical systems here are:

These are arranged on a single y-axis translation so that, in conjunction with OH1, a variety of different optical configurations maybe used with rapid changing between arrangements. Also, for high-energy nano-focussing applications, two sets of nano lenses are available. These are mounted directly to the diffractometer in EH3 in order that the optics and sample vibrate in tandem.

Compound focusing

Many of these focusing elements can be profitably used in series to condition the beam in different ways. By using two transfocators, or a transfocator and the nanofocus chips in series, almost the entire beam may be microfocused, leading to an extremely intense spot. The horizontal mirror can be used in conjunction with a single vertically focusing chip, in order to take the entire horizontal beam, with almost no effect on the vertical focus. In this way, intense beams with sizes ~ 10 x 0.1 μm can be produced.

Primary optic (OH1)

Secondary optic     (OH2/EH3)

 Achievable focus (horizontal x vertical, μm) Energy range
(keV)		 Maximum flux in spot
(photons/s)		 Schematic layout Notes
L-L IAT 3 x 1.0 30 - 140 5 x 1012 Link to image Point focus
L-L nCRL 0.50 x 0.25 30 - 80 5 x 109 Link to image  
L-L KB 4 x 2.5 18 - 100 5 x 1012 Link to image Line focus
L-L + IVT / 220 x 50 (EH3) & 45 x 6 (EH1) 18 - 140 (EH3) & 18 - 75 (EH1) 5 x 1013 Link to image Point focus
L-L + IVT IAT 4 x 1.7 18 - 45 3 x 1013 Link to image Point focus
IVT + Pin hole   20 x 7 18 - 75  1014 Link to image  

Table showing the properties of different optical arrangements at ID11. The abbreviations are as follows; L-L (laue-Laue), IVT (In-Vacuum Transfocator), IAT (In-Air Transfocator), KB (Kirkpatrick-Baez mirror) and nCRL (nano Compact Refractive Lenses).