expected to result in technology exploitation opportunities. It will look ahead towards nurturing LEAPS as an integrated platform with and for industry, realising the combined power of European light sources. The project is expected to start in April 2021.
NFFA Pilot, coordinated by the CNR, builds on the highly successful original NFFA integrating activity, improving access to nano-science facilities across Europe. The ESRF will coordinate the industrial outreach activity, building on the position paper developed in the original NFFA on the most effective ways for industry engagement in a distributed network.
RADNEXT, coordinated by CERN, aims to establish a distributed research infrastructure for the community of irradiation of materials and electronic devices using ionising radiation. The ESRF will lead industrial outreach, focusing on irradiation services being developed in the context of Grenoble s IRT NanoElec, and drawing on an innovation-led long-term proposal at the ESRF s ID09 beamline.
In other European projects, the ESRF is involved in EASISTRESS, aiming to develop a routine approach to stress and strain measurement using complementary techniques, as well as NanoMECommons, working with a local SME in Grenoble to mature advanced techniques to measure strain in semiconductor substrates, and the RItrainplus programme on strengthening human capital at European research infrastructures, where the ESRF will be leading on supporting innovation.
Looking forwards to 2021
Although the ESRF will remain in remote operation into the first months of 2021, we are very much looking forward to being able to welcome back clients to our site in Grenoble, to renew links with the industry offices of the light and neutron sources, and to go out and about once more to show off the potential of the ESRF s facilities, skills and technology for industry. Don t hesitate to contact us if you d like the ESRF to visit your company to listen to your R&D challenges and to explain how the ESRF s synchrotron X-rays can help.
E. MITCHELL
