Layout

The ID15 straight section houses two canted branches. This page is dedicated to the ID15A branch, which houses the materials chemistry (EH3) and materials engineering (EH2) facilities. The ID15B branch houses a high pressure beam line (EH1), which operates independently of ID15A and has its own webpage. The overall layout is shown here:

X-ray source

The primary insertion device is a CPMU18 undulator, which provides brilliant x-rays in the range 20 -140 keV for materials chemistry applications in EH3. A comparison of the performance of the ID15A sources before and after the upgrade is shown below, illustrating the significant flux increase, particularly at high energy.

ID15A also houses a compact wiggler source (W76), which provides a continuous spectrum up to several hundred keV for materials engineering applications. 

X-ray optics

Two monochromators are available. The first is a double multilayer mirror (DMLM) at 40 m from the source in OH1. The DMLM provides very high flux at the expense of a band pass of around 0.37%, and is particularly useful in the lower-energy range of the beamline. The second monochromator is a liquid nitrogen-cooled double-Laue Si monochromator (LLM) mounted in OH2. The LLM provides excellent flux and tunability over the range 40 - 140 keV. The band pass may be tuned from 0.01 to 0.5% by adjusting the bending of the crystals.

Several options for X-ray focusing are available for monochromatic beams. Transfocators, which consist of motorized cartridges of X-ray refractive lenses, achieve independent vertical and horizontal focusing using 1D Aluminium and Beryllium lenses placed at 32 and 53 m from sample, respectively. With transfocators, the beam size in EH3 can be tuned down to around 15 µm. Focusing to beam sizes down to 0.3 µm is possible using either refractive lenses placed at 1-4 m from sample or a KB-mirror system at 0.35-0.62 m from sample. The optical layout of the beamline is shown below.