The 9th International Conference on the Physics of X-Ray Multilayer Structures

Multilayer thin film structures optimized for their X-ray optical properties have enabled the construction of a variety of new optical elements and instruments operating in the EUV, soft X-ray and hard X-ray spectral regions. This technology is by now used for a wide range of scientific and industrial applications, including photolithography, astronomy and solar physics, plasma physics, synchrotron radiation, X-ray and free-electron lasers, ultrashort-pulse physics, X-ray crystallography, and others. Continued advancement in these areas depends on further improvements in multilayer technology, which in turn requires a deeper understanding of the X-ray optical physics and material science of these nanometer-scale heterostructures.

Principal Themes

• Film Growth
• Microstructure Development
• Roughness Evolution
• Interface Formation
• Surface and Thin-Film Modifications using Ion Beams
• Film Removal Techniques
• Growth Models and Computer Simulations
• X-ray and Neutron Scattering
• Surface and Interface Topology
• Layer and Interface Composition
• Wavefront Characterization
• Mechanical Properties
• Stability
• Optical Properties
• Novel Characterization Techniques
• Multilayer X-Ray Optics
• Wavefront Correction
• Bandpass Optimization
• Polarization Control